Product Introduction: ESC Monitoring Unit (Capacitive Sensor)
HOMEProduct Introduction: ESC Monitoring Unit (Capacitive Sensor)
Connects between the electrostatic chuck (ESC) and the control power supply to continuously monitor the status of the ESC and the workpiece.
Appearance
ESC Monitoring Unit
Applications
Detect workpieces via changes in capacitance
Identify materials based on capacitance values
Distinguish top and bottom sides by differences in capacitance values
Continuously monitor the status of the ESC
Key Features
Detects capacitance between the ESC and the workpiece, enabling real-time monitoring of process abnormalities and workpiece status.
Adds sensor functionality without requiring modifications to the ESC or its control power supply.
Equipped with digital (2ch) and analog output I/O for seamless communication with production equipment.
Connection Image
Specification
Dimensions
W160mm×H85mm×D250mm Excluding protrusions
Weight
Approx. 900g
Detection Objects
Silicon wafers, metal foils, various conductive films
Input Voltage
DC 24V
Withstand Voltage
DC±2.0kV (bipolar ESC)
Power Consumption
2.4W (typical)
Operating Temperature
0 to 65°C (non-condensing)
Digital Output
Open collector (NPN non-contact type)
Reference Voltage
Two settings available
Connector Type
Power supply side: MHV
ESC side: MHV
Warnings
Follow our recommended usage methods for proper operation.
Carefully read the instruction manual before using this product.
Do not use this product for any purpose other than its intended use.
Reference Data: Example of Loading Detection
Capacitive sensors monitor changes in the detection electrode (ESC internal electrode) and its surrounding environment as variations in capacitance. The capacitance values measured by the detection unit are converted into voltage signals. By setting a reference voltage and comparing it to the detection voltage, it is possible to identify specific modes or detect unexpected defects. Below are the results of detecting various states of a silicon wafer placed on an ESC using an ESC Monitoring Unit.
Equipment Used
Workpiece: Φ300mm silicon wafer
ESC: Φ300mm ceramic bipolar ESC
Control Power Supply: Our ESC control power supply (Model: CTPS-3KV2AF)
Detection Unit: Our ESC Monitoring Unit
Electrical Signal
Capacitance changes in each state are converted into electrical signals as follows:
(1) Wafer off: The state where no silicon wafer is present on the ESC, set as the reference (0 V).
(2) Wafer on: The state where the silicon wafer is placed on the ESC.
(3) Chucking: The state where the silicon wafer is gripped by turning on the control power supply.
(4) Dechucking: The state where the control power supply is turned off.
(5) Wafer off: The state where the silicon wafer is removed from the ESC.
Notes
The detection results shown above are for reference only and must be verified with your specific ESC, control power supply, and workpiece. Validation under actual connection methods and operating environments is required prior to use.
Download Information
Various information is available for download here
